BYK-1880
무용제 및 무용제 시스템의 에어리스 또는 에어스프레이 도장 적용을 위한 무용제 실리콘 함유 소포제
January 28 & 29, 2025
60 minutes - online - free of charge - available in two different time zones - only in English
Get ready for the challenges of tomorrow's lab. Start the New Year with forward-thinking insights. On January 28 and 29, 2025, we will offer you exclusive knowledge on the formulation of 2-pack PUR and polyaspartic systems. BYK's technical experts will present the latest developments in the selection and application of wetting and dispersing additives, rheology additives, surface additives and defoamers. Learn more about the chemistry and working mechanism of these additives and take advantage of this opportunity to learn about modern test methods and new product developments that meet the latest regulatory requirements.
Attendance is free of charge. Make sure you're ready for the lab challenges of tomorrow by registering today.
Tanja Berning
End Use Specialist Special Coatings
Mathis Kuleßa
Technical Service General Industrial Coatings
Agenda
Tuesday, January 28, 2025 9.00 - 10.00 a.m. (CET) or alternatively 4.00 - 5.00 p.m. (CET)
Wednesday, January 29, 2025 9.00 - 10.00 a.m. (CET) or alternatively 4.00 - 5.00 p.m. (CET)
All products featured at this WEBseminar can be found here. Find the additive sample you need:
Surface additive based on a silicone- and polyether-modified acrylate copolymer for high- and medium-solid coating systems
Solvent-free, silicone-containing surface additive for solvent-borne and solvent-free coating systems
레벨링을 향상시키는 유성, 무용제, 방사선 경화 및 수성 시스템용 실리콘 함유 표면 첨가제
유용성 및 UV 경화형 도료용 비실리콘 소포제
유성, 수성 및 UV 도료 시스템과 인쇄 잉크용 실리콘 함유 표면 첨가제
유용성 도료 및 고농도 착색제용 습윤분산제
Don´t miss the exclusive opportunity to:
Who should attend this WEBseminar?
Want to participate?
Please register by Tuesday, January 28, 2025. After your registration, we will send you a confirmation and the login data for this exclusive WEBseminar via email.
Questions or comments?
Just fill in the contact form below. Our seminar team looks forward to supporting you.